• Chinese Journal of Lasers
  • Vol. 36, Issue s1, 324 (2009)
Jiamiao Ni*, Qingnan Zhao, and Xiujian Zhao
Author Affiliations
  • Key Laboratory of Silicate Materials Science and Engineering, Wuhan University of Technology, Ministry of Education, Wuhan, Hubei 430070, China
  • show less
    DOI: Cite this Article Set citation alerts
    Jiamiao Ni, Qingnan Zhao, Xiujian Zhao. Design and Fabrication of Multilayer SiO2/CeO2-TiO2/SiO2 Coatings with UV Absorption and High Quality Transparence Properties[J]. Chinese Journal of Lasers, 2009, 36(s1): 324 Copy Citation Text show less

    Abstract

    New transparence and ultraviolet (UV) absorption coatings having the sandwich structure of SiO2/CeO2-TiO2/SiO2 were deposited on the soda-lime silicate glass by radio frequency (R.F.) magnetron sputtering. The computer aid simulation for optical characterization has been used to optimize multilayer coatings to obtain high transparent and good UV absorbing properties. Optimum thickness of SiO2 and CeO2-TiO2 films were obtained. Several analytical tools such as spectrophotometer, scanning electron microscopy, and digital camera were used to characterize possible changes in optical properties. These results suggest that the single addition of inner layer SiO2 film has no distinct effect on improving transmittance and decreasing reflection rate in the visible light range, whereas the main function of this layer film is to improve the adhesion of the coating to glass substrate. In contrast, the outer layer SiO2 film plays a main role on diminishing the interference yellow coloring and increasing transparence. Therefore the three-layered SiO2(113 nm)/CeO2-TiO2(342 nm)/SiO2(113 nm) films show good UV absorption (>99%) properties, high transparence (average value of ~89%) and low average reflection rate (as low as ~9%) in the visible light range.
    Jiamiao Ni, Qingnan Zhao, Xiujian Zhao. Design and Fabrication of Multilayer SiO2/CeO2-TiO2/SiO2 Coatings with UV Absorption and High Quality Transparence Properties[J]. Chinese Journal of Lasers, 2009, 36(s1): 324
    Download Citation