• Semiconductor Optoelectronics
  • Vol. 43, Issue 5, 942 (2022)
MAO Lulu1, LIANG Lili1, and LIANG Jiyun2、3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2022050901 Cite this Article
    MAO Lulu, LIANG Lili, LIANG Jiyun. Phase Solution of Extremum Feature of Grating Projection Interferogram with Random Step Size[J]. Semiconductor Optoelectronics, 2022, 43(5): 942 Copy Citation Text show less

    Abstract

    For the problems that the traditional phase-shifting interferometry required multiple interferograms, which thus required high stability of the measurement equipment, resulting in slow phase extraction, a phase solving method of two-frame random phase-shifting interferograms based on the special extremum feature of the interferogram was proposed. This method required only two-frame interferograms. The two-frame interferograms with random phase shifting were processed separately by Gaussian high-pass filter to filter out their backgrounds. Then the phase shifting between these two interferograms was determined by a certain number of special extremum feature pixels in the interferogram. Finally, the phase of the interferogram was calculated according to the phase-shifting phase extraction algorithm of the arctangent function. The comparison results of simulation and actual measurement show that this method can obtain high-precision measurement phase through two-frame random phase-shifting interferograms, greatly reducing the influence of measurement system errors on the phase solving results. For the 256×256pixels interferogram of the eye part of the plaster model, the execution time is within 0.02s, which is fast for phase extraction.
    MAO Lulu, LIANG Lili, LIANG Jiyun. Phase Solution of Extremum Feature of Grating Projection Interferogram with Random Step Size[J]. Semiconductor Optoelectronics, 2022, 43(5): 942
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