Hao Liu, Ping Ma, Yunti Pu, Zuzhen Zhao. Impact of annealing on laser resistance of HfO2 films fabricated byALD, IBS and EBE techniques[J]. High Power Laser and Particle Beams, 2020, 32(7): 071002
- High Power Laser and Particle Beams
- Vol. 32, Issue 7, 071002 (2020)
Fig. 1. Schematic of the IBS and ALD equipments
Fig. 2. Test benches for LIDT
Fig. 3. Dispersion of HfO2 films deposited by different techniques
Fig. 4. 0% LIDT of different HfO2 films
Fig. 5. Laser damage probabilities of different HfO2 films
Fig. 6. The laser damage probability of 500 ℃ annealed ALD HfO2 film irradiated by 10 pulses and 10 000 pulses
Fig. 7. Laser damage morphologies
Fig. 8. Impact of defect on the local temperature in the defect-induced laser damage model
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Table 1. The weak absorption of ALD HfO2 film annealed at different temperature
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