• Chinese Journal of Lasers
  • Vol. 35, Issue 9, 1384 (2008)
Zhu Jie1、2、*, Xie Kang1, Zhang Hui2, Hu Juntao2, and Zhang Pengxiang2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    Zhu Jie, Xie Kang, Zhang Hui, Hu Juntao, Zhang Pengxiang. Influence of Deposition Temperature on Growth Orientation of PZT/LSAT Thin Film[J]. Chinese Journal of Lasers, 2008, 35(9): 1384 Copy Citation Text show less

    Abstract

    Pb(Zr0.3Ti0.7)O3 (PZT) ferroelectric thin films are grown by pulsed laser deposition (PLD) on LaSrAlTaO3 (LSAT) single crystal substrates from sintered targets of Pb(Zr0.3Ti0.7)O3 and Pb1.1(Zr0.3Ti0.7)O3 (excessive 10%-Pb) with variable temperature of 550~750 ℃, respectively. The pattern observed by X-ray diffraction (XRD) indicates that the orientation of thin film growth transits from approximate c-axis at 550 ℃ to approximate a-axis at 750 ℃ gradually in the no-excessive situation. But in the lead excessive situation, the thin film growth has no obvious transition change. Surface morphology measured by atomic force microscopy (AFM) demonstrates that the root-mean-square (RMS) roughnesses are 16.9 nm and 13.7 nm respectively when the PZT films are grown of approximate c-axis and a-axis. But in the mixed growth orientation, the RMS roughness was about 68 nm due to the competition growth.
    Zhu Jie, Xie Kang, Zhang Hui, Hu Juntao, Zhang Pengxiang. Influence of Deposition Temperature on Growth Orientation of PZT/LSAT Thin Film[J]. Chinese Journal of Lasers, 2008, 35(9): 1384
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