• Chinese Journal of Lasers
  • Vol. 41, Issue 4, 416003 (2014)
Cai Yanmin*, Wang Xiangzhao, and Huang Huijie
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/cjl201441.0416003 Cite this Article Set citation alerts
    Cai Yanmin, Wang Xiangzhao, Huang Huijie. Optical Design of Lithography Projective Lens with Variable Total Track[J]. Chinese Journal of Lasers, 2014, 41(4): 416003 Copy Citation Text show less

    Abstract

    The printed circuit board (PCB), such as the high density interconnection (HDI), can be exposed by the laser direct image (LDI) lithography tool when the thickness range of the HDI substrate is from 0.025 mm to 3 mm. Accordingly, it is designed that the total track of a lithography projective lens is variable. The double telecentricity layout is used and the range of variable total track is 3 mm by reduction of double telecentricity error. The image quality of this projective lens, such as wave front error (WFE), distortion and modulation transfer function (MTF), is very good when the range of the variable total track is from 0 to 3 mm by the reasonable match between positive lenses and negative lenses. It is confirmed that a lithography projective lens with a variable total track is available by this method of reduction of double telecentricity error, and the image quality of this projective lens with the variable total track meet the actual requirements of the LDI lithography tool.
    Cai Yanmin, Wang Xiangzhao, Huang Huijie. Optical Design of Lithography Projective Lens with Variable Total Track[J]. Chinese Journal of Lasers, 2014, 41(4): 416003
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