• Optics and Precision Engineering
  • Vol. 30, Issue 15, 1836 (2022)
Chang LU1, Fengchuan XU2, Yishen XU1,3,4, Linsen CHEN4, and Yan YE1,3,4,*
Author Affiliations
  • 1School of Optoelectronic Science and Engineering, Soochow University, Suzhou25006, China
  • 2Suzhou City University, Suzhou15104, China
  • 3Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou215006, China
  • 4Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province & Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou215006, China
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    DOI: 10.37188/OPE.20223000.0144 Cite this Article
    Chang LU, Fengchuan XU, Yishen XU, Linsen CHEN, Yan YE. Interference lithography of space-variant grating structures by phase modulation[J]. Optics and Precision Engineering, 2022, 30(15): 1836 Copy Citation Text show less

    Abstract

    The modulation of the phase wavefront of geometric phase metasurface lenses does not depend on the cumulative phase of the propagation process. However, it affects the local polarization state through the space-variant unit structure and introduces the conjugate additional phase that focuses the incident beam, which differs from the characteristics of traditional refractive lenses. For interference lithography fabrication of geometric phase metalens structures, an optical Fourier transform system modulated by a space-variant phase element is proposed in this study. Subsequently, the orientation and frequency-variant micron structures were prepared using interference lithography. Based on the Fourier transform theory of optical lens and geometric propagation principle of light diffraction, the influence of light field on image plane based on the inserted sub-phase-elements with different frequencies, orientations, and relative positions was analyzed. Therefore, a method was proposed for multi-interference light fields with sectionalized modulation of space-variant phase elements on incident light. Moreover, the preparation of orientation and period-variant micron structure based on multiple simultaneously generated light fields were illustrated. Accordingly, utilizing the designed and fabricated space-variant phase element, interference light fields with circle and ring distributions were simultaneously generated. The experimental results demonstrate that space-variant grating structures with orientations of 0°, 125°, and 235°, periods of 7.22, 6.51, and 5.78 μm, and micron pattern structure with radius of 1 892 μm can be obtained simultaneously. The proposed optical system is simple and easy to be combined with a projection exposure system and has great potential for manufacturing geometric phase metalens devices based on a space-variant micro-nano unit cell.
    Chang LU, Fengchuan XU, Yishen XU, Linsen CHEN, Yan YE. Interference lithography of space-variant grating structures by phase modulation[J]. Optics and Precision Engineering, 2022, 30(15): 1836
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