High ion current density plasma source for ion-assisted deposition of optical thin films

Frank Placido; Des Gibson

doi:10.3788/COL201008s1.0049

Journals >Chinese Optics Letters >Volume 8 >Issue s1 >Page 49 > Article

Chinese Optics Letters
Vol. 8, Issue s1, 49 (2010)

High ion current density plasma source for ion-assisted deposition of optical thin films

Frank Placido¹ and Des Gibson²

Author Affiliations

¹Thin Film Centre, University of the West of Scotland Paisley, Paisley, PA1 2BE, Scotland

²Thin Film Solutions Ltd., Block 7, West of Scotland Science Park, Glasgow G20 0TH, Scotland

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DOI: 10.3788/COL201008s1.0049 Cite this Article Set citation alerts

Frank Placido, Des Gibson. High ion current density plasma source for ion-assisted deposition of optical thin films[J]. Chinese Optics Letters, 2010, 8(s1): 49 Copy Citation Text

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References

[1] P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, and W. G. Sainty, Appl. Opt. 22, 178 (1983).

[2] M. L. Fulton, Proc. SPIE 2253, 374 (1994).

[3] B. G. Bovard, Thin Films for Optical Systems F. R. Flory, (ed.) (Marcel Dekker, New York, 1994).

[4] H. R. Kaufman, R. S. Robinson, and R. I. Seddon, J. Vac. Sci. Technol. A5 (4), 2081 (1987).

[5] A. Zoller, S. Beisswenger, R. Golzelmann and K. Matl, Proc. SPIE 2253, 394 (1994).

[6] D. R. Gibson, D. Yates, J. O’Driscoll, and J. Allen, in Proceedings of SVC Conference. (2002).

[7] J. D. Targrove, L. J. Lingg, and H. A Macleod, Optical Interference Coatings (Washington Optical Society of America, Tucsen, 1988), p268.

[8] D. R. Gibson, in Proceedings of SVC Conference(2002).

[9] D. R. Gibson, Patent No. EP 1154459 A2.

Data from CrossRef

[1] Oleg Baranov, Jinghua Fang, Kostya (Ken) Ostrikov, Uro? Cvelbar. TiN deposition and morphology control by scalable plasma-assisted surface treatments. Materials Chemistry and Physics, 188, 143(2017).

[2] Oleg Baranov, Maxim Romanov, Jinghua Fang, Uros Cvelbar, Kostya (Ken) Ostrikov. Control of ion density distribution by magnetic traps for plasma electrons. Journal of Applied Physics, 112, 073302(2012).

Frank Placido, Des Gibson. High ion current density plasma source for ion-assisted deposition of optical thin films[J]. Chinese Optics Letters, 2010, 8(s1): 49

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