• Opto-Electronic Engineering
  • Vol. 31, Issue 2, 1 (2004)
[in Chinese]1、2, [in Chinese]1, [in Chinese]2, [in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]1
Author Affiliations
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  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Lithography and Reactive Ion Etching of Silicon-Based Photon Crystal Slab[J]. Opto-Electronic Engineering, 2004, 31(2): 1 Copy Citation Text show less

    Abstract

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Lithography and Reactive Ion Etching of Silicon-Based Photon Crystal Slab[J]. Opto-Electronic Engineering, 2004, 31(2): 1
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