[1] John J Biafore, Chris A Mack, Stewart A Robertson, et al.. The causes of horizontal-vertical (H-V) bias in optical lithography: dipole source errors[C]. SPIE, 2007, 6520 : 1-18.
[2] Stephen P Penwick. Quasi-telecentricity: the effects of unbalanced multipole illumination[C]. SPIE, 2007, 6520: 1-11.
[3] Hanxiang Bai, Samuel P. Sadoulet. Large-format telecentric lens[C]. SPIE, 2007, 6667: 1-18.
[4] Jangho Shin, SukJoo Lee, Hochul Kim, et al.. Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns[C]. SPIE, 2005, 5754: 294-302.
[5] Gregory McIntyre, Chiew-seng Koay, Martin Burkhardt, et al.. Modeling and experiments of non-telecentric thick mask effects for EUV lithography[C]. SPIE, 2009, 7271: 1-12.
[6] Pan Bing, Yu Liping, Wu Dafang. High-accuracy two-dimensional digital image correlation measurement system using a bilateral telecentric lens[J]. Acta Optica Sinica, 2013, 33(4): 0412004.
[7] Hu Zhonghua, Yang Baoxi, Zhu Jing, et al.. Design of diffractive optical element for pupil shaping optics in projection lithography system[J]. Chinese J Lasers, 2013, 40(6): 0616001.
[8] Reinhard Voelkel, Uwe Vogler, Andreas Bich, et al.. Advanced mask aligner lithography: new illumination system[J]. Opt Express, 2010, 18(20): 20968-20970.
[9] Warren J Smith. Modern Optical Engineering[M]. New York: McGraw-Hill, 2008. 215-328.
[10] Weicai Xu, Wei Huang, Chunlai Liu, et al.. Automatic clocking optimization for compensating two-dimensional tolerances[J]. Opt Express, 2013, 21(19): 22145-22152.
[11] Chunlai Liu, Wei Huang, Zhenguang Shi, et al.. Wavefront aberration compensation of projection lens using clocking lens elements[J]. App Opt, 2013, 52(22): 5398-5401.