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Journals >Chinese Journal of Lasers >Volume 18 >Issue 5 >Page 353 > Article

Chinese Journal of Lasers
Vol. 18, Issue 5, 353 (1991)

Ion-assisted deposition of optical thin films at different ion beam energies

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[in Chinese], [in Chinese]. Ion-assisted deposition of optical thin films at different ion beam energies[J]. Chinese Journal of Lasers, 1991, 18(5): 353 Copy Citation Text

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Abstract

Optical properties, laser-induced damage theresholds and microstroctares of IAD thin films at different energy bombardment were investigeted and analysed with TiO2 thin film as an example.

Keywords

absorption scattering bombardmant energy damage threshold microstructure'' ion-assisted deposition optical properties thin film

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[in Chinese], [in Chinese]. Ion-assisted deposition of optical thin films at different ion beam energies[J]. Chinese Journal of Lasers, 1991, 18(5): 353

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