• Chinese Journal of Lasers
  • Vol. 49, Issue 21, 2101003 (2022)
Lizhao Yang1、2, Xiaodong Fang1、2、3, and Libing You3、4、*
Author Affiliations
  • 1School of Environmental Science and Optoelectronic Technology, University of Science and Technology of China, Hefei 230026, Anhui, China
  • 2Anhui Province Key Laboratory of Photonic Devices and Materials, Anhui Institute of Optics and Fine Mechanics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, Anhui, China
  • 3College of New Materials and New Energies, Shenzhen Technology University, Shenzhen 518118, Guangdong, China
  • 4Shenzhen Shengfang Technology Company Ltd., Shenzhen 518173, Guangdong, China
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    DOI: 10.3788/CJL202249.2101003 Cite this Article Set citation alerts
    Lizhao Yang, Xiaodong Fang, Libing You. Numerical Analysis of Gas Flow Field of High-Power Excimer Laser[J]. Chinese Journal of Lasers, 2022, 49(21): 2101003 Copy Citation Text show less
    References

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    [14] Kakizaki K, Sasaki Y, Inoue T et al. High-repetition-rate (6 kHz) and long-pulse-duration (50 ns) ArF excimer laser for sub-65 nm lithography[J]. Review of Scientific Instruments, 77, 035109(2006).

    [15] Tanaka S, Tsushima H, Nakaike T et al. GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography[J]. Proceedings of SPIE, 6154, 61542O(2006).

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    Lizhao Yang, Xiaodong Fang, Libing You. Numerical Analysis of Gas Flow Field of High-Power Excimer Laser[J]. Chinese Journal of Lasers, 2022, 49(21): 2101003
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