The graphite-like films were prepared on silicon substrate by using the pulsed KrF laser ablation of a polyimide target, and the field electron emission from the film was observed. After arc forming between the graphite-like film cathode and the indium-tin-oxide (?ΤΟ) glass anode, the turn-on field of the graphite-like film decreases from 16.9 to 10.8 V/μm. The current density is 0.4 mA/cm2, and the emission sites density is in order of 106 /cm2 at the applied field of 20 V/μm. The morphology and the structure of the graphite-like film were measured by using Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). It indicates that there exist graphite-like clusters in the deposition film, which we named as the graphite-like film. The surface structures of the film before and after the field emission measurements were investigated by scanning electron microscopy (SEM).