Analysis of the Exposure Dose Distribution for LDW System

XIE Yong-jun; LU Zhen-wu; LI Feng-you; WENG Zhi-cheng; Zhao Jing-li

Journals >Chinese Journal of Lasers >Volume 30 >Issue s1 >Page 39 > Article

Chinese Journal of Lasers
Vol. 30, Issue s1, 39 (2003)

Analysis of the Exposure Dose Distribution for LDW System

XIE Yong-jun, LU Zhen-wu, LI Feng-you, WENG Zhi-cheng, and Zhao Jing-li

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[in Chinese]

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XIE Yong-jun, LU Zhen-wu, LI Feng-you, WENG Zhi-cheng, Zhao Jing-li. Analysis of the Exposure Dose Distribution for LDW System[J]. Chinese Journal of Lasers, 2003, 30(s1): 39 Copy Citation Text

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References

[1] H. J. Levinson, W. Η. Arnold. Focus: The critical parameter for submicron lithography [J]. J. Vac. Set. TechnoL，1987, B5(6):293-298

[2] M. Haruna, M. Takahashi, K. Wakahayashi et al.. Laser beam lithographed microfresnel lenses [J]. Appl. Opt., 1990，29(34):5120-5126

XIE Yong-jun, LU Zhen-wu, LI Feng-you, WENG Zhi-cheng, Zhao Jing-li. Analysis of the Exposure Dose Distribution for LDW System[J]. Chinese Journal of Lasers, 2003, 30(s1): 39

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