[2] BLOENBERGEN N. Role of cracks, pores, and absorbing inclusions on laser induced damage threshold at surfaces of transparent dielectrics[J]. Applied Optics, 1973, 12(4): 661-664.
[3] GNIN F Y, SALLEO A, PISTOR T V, et al. Role of light intensification by cracks in optical breakdown on surfaces[J]. Journal of the Optical Society of America A, 2001, 18(10): 2607-2616.
[4] STEVENS-KALCEFF M A, STESMANS A, WONG J. Defects induced in fused silica by high fluence ultraviolet laser pulses at 355 nm[J]. Applied Physics Letters, 2002, 80(80): 758-760.
[5] NEAUPORT J, LAMAIGNERE L, BERCEGO L H, et al. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm[J]. Optics Express, 2005, 13(25): 10163-10171.
[6] NEAUPORT J, AMBARD C, CORMONT P, et al. Subsurface damage measurement of ground fused silica parts by HF etching techniques[J]. Optics Express, 2009, 17(22): 20448-20456.
[8] XU Shi-zhen, L Hai-bing, TIAN Dong-bin, et al. Effects of acid2etching depth on 355 nm laser induced damage threshold of fused silica[J]. High Power Laser and Particle Beams, 2008, 20(5): 760-764.
[9] SURATWALA T I, WONG L L, MILLER P E, et al. Sub-surface mechanical damage distributions during grinding of fused silica[J]. Journal of Non-crystalline Solid, 2006, 352(52-54): 5601-5617.
[10] ZHU Zhi-hong, YE Wei-min, JI Jia-rong, et al. Transmission properties research of photonic crystal slab W3 waveguide with the use of the parallel 3D FDTD algorithm[J]. Acta Photonica Sinica, 2006, 35(6): 815-818.
[11] SHENTU Wei-jin, CAI Chun, DAI Jing-cao, et al. Boundary condition and initial condition in the time-domain beam propagation methods applied to study planar waveguides[J]. Acta Photonica Sinica, 2005, 34(4): 337-341.
[12] WANG Feng-rui, HUANG Jin, LIU Hong-jie, et al. Laser induced rear-surface-crack damage properties of fused silica etched with HF solution[J]. Acta Physica Sinica, 2010, 59(7): 5122-5127.
[13] WANG Feng-rui, LIU Hong-jie, HUANG Jin, et al. Simulation of light intensification induced by defects of polished fused silica[J]. Chinese Physics Letter, 2011, 28(1): 014206.
[14] HAMZA A V, SIEKHAUS W J, RUBENCHIK A M, et al. Engineered defects for investigation of laser-induced damage of fused silica at 355 nm[C]. SPIE, 2002, 4679: 96-107.
[15] CAMP D W, KOZLOWSKI M, SHCEHAN L M, et al. Subsurface damage and polishing compound affect the 355 nm laser damage threshold of fused silica surfaces[C]. SPIE, 1998, 3244: 356-364.