TiN films coated on glass by D. C. reactive magnetron sputtering of a titanium target were deposited using the variation of the deposition conditions such as total pressure and the ratio of N2 to Ar. The preferred orientation and N/Ti ratio of TiN films were investigated by measuring the X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The results of the XRD show that the XRD intensity ratio (R) of (200) to (111) gradually decreased with the increase of the total pressure. When the total pressure is approximately 1.0 Pa, the value of the R is approximately 1. When the total pressure is not changed, the R is increased with the increase of the N2. The results of the XPS show that the atomic ratio of Ν to Ti is larger than 1 for all the TiN films when the ratio of N2 to Ar is changed from 1% to 7%.