[1] salgueiro J R ,Román J F,Moreno V.System for laser writing to lithograph masks for integrated optics.Opt Eng,1998,37(4):1115～1123

[2] Harurna M,Takahashi M,Wakahayashi K,et al.Laser beam lithographed micro-Fresnel lenses.Appl Opt,1990,29(34):5120～5126

[3] Baber S C.Application of high resolution laser writers to computer generated holograms and binary diffractive optics.Proc SPIE,1989,1052:66～76

[5] salgueiro J R,Moreno V,Lin～ares J.Model of linewidth for laser writing on a photoresist.Appl Opt,2002,41(5):895～901

[6] Yang Guoguang and Sheng Yibing.Research on laser direct writing system and its lithography properties.Proc SPIE,1998,3550 :409～418

[8] Dill F H,Hornberger W P,Hauge P S,et al.Characterization of positive photoresist.IEEE Transaction on Electron Devices,1975,22(7):445～452

[9] Mack C A.Enhanced lumped parameter model photolithography.Proc SPIE,1997,2197,501～510

[11] Li Fengyou,Lu Zhenwu,Xie Yongjun,et al.Laser direct writing system with cartesian and polar coordinate.Acta Photonica Sinica,2002,31(5):616～619