XeF Excimer UV Emission Spectrum Excited by Discharge with Surface Preionization over the Teflon Plate

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 25 >Issue 3 >Page 220 > Article

Chinese Journal of Lasers
Vol. 25, Issue 3, 220 (1998)

XeF Excimer UV Emission Spectrum Excited by Discharge with Surface Preionization over the Teflon Plate

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. XeF Excimer UV Emission Spectrum Excited by Discharge with Surface Preionization over the Teflon Plate[J]. Chinese Journal of Lasers, 1998, 25(3): 220 Copy Citation Text

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Abstract

The XeF excimer is formed in an excimer laser with surface preionization along a Teflon plate by discharge excitation of a Xe/Ne mixture without additional fluorine donor gases. Emission spectra at central wavelengths 351, 353 and 308 nm are studied. The KrF fluorescence spectrum at 248 nm is observed when a Kr/Ne mixture is excited.

Keywords

excimer emission spectrum surface preionization without additional fluorine donor gas

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