• Optics and Precision Engineering
  • Vol. 32, Issue 13, 2081 (2024)
Saisai XUE*, Xiaoguang GUO, Yufan JIA, Shang GAO, and Renke KANG
Author Affiliations
  • State Key Laboratory of High-Performance Precision Manufacturing, Dalian University of Technology, Dalian116024, China
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    DOI: 10.37188/OPE.20243213.2081 Cite this Article
    Saisai XUE, Xiaoguang GUO, Yufan JIA, Shang GAO, Renke KANG. Double-sided lapping uniformity of LiTaO3 based on three-dimensional trajectory of particles[J]. Optics and Precision Engineering, 2024, 32(13): 2081 Copy Citation Text show less
    Material removal in different models
    Fig. 1. Material removal in different models
    Abrasive unit cell model
    Fig. 2. Abrasive unit cell model
    Surface morphology of fixed abrasive pad
    Fig. 3. Surface morphology of fixed abrasive pad
    Micro contact morphology between fixed abrasive lapping pad and workpiece
    Fig. 4. Micro contact morphology between fixed abrasive lapping pad and workpiece
    Penetration depth of abrasive
    Fig. 5. Penetration depth of abrasive
    Schematic diagram of double-sided lapping movement
    Fig. 6. Schematic diagram of double-sided lapping movement
    Schematic diagram of wafer discretization
    Fig. 7. Schematic diagram of wafer discretization
    CTD calculation process
    Fig. 8. CTD calculation process
    Variation law of CTD with m and n
    Fig. 9. Variation law of CTD with m and n
    Variation law of CTD with n
    Fig. 10. Variation law of CTD with n
    Variation of CTD with m
    Fig. 11. Variation of CTD with m
    Consolidated abrasive lapping devices
    Fig. 12. Consolidated abrasive lapping devices
    Variation of CTD and TTV with m and n
    Fig. 13. Variation of CTD and TTV with m and n
    ParameterValue
    Speed of lower plate ωp/(r·min-10~45
    Speed of sun wheel ω1/(r·min-10~20
    Speed of gear ring ω3/(r·min-10~16
    Number of teeth of sun wheel Z198
    Number of teeth of planetary wheel Z2108
    Number of teeth of gear ring Z3314
    Table 1. Specific parameters of MoriNaga ED9B-10L-3M double-sided lapping machine
    ParameterValueParameterValue
    ρ3.5 g/cm3s5.3 mm
    D4 μmC0.5 g/cm3
    ψ45°Hv11.2 GPa
    r1.9 mmE222.4 GPa
    H1.5 mmSw81 cm2
    Table 2. Experimental parameters
    mnCTDmnCTD
    0.61.00.143 30.81.90.154 7
    0.61.30.159 90.82.20.155 7
    0.61.60.171 70.91.00.200 9
    0.61.90.153 40.91.30.135 4
    0.62.20.156 30.91.60.147 2
    0.71.00.141 80.91.90.154 6
    0.71.30.142 90.92.20.154 6
    0.71.60.152 91.01.00.214 6
    0.71.90.155 71.01.30.182 8
    0.72.20.152 11.01.60.140 8
    0.81.00.157 71.01.90.132 9
    0.81.30.132 21.02.20.139 9
    0.81.60.140 4
    Table 3. CTD at different m and n
    Saisai XUE, Xiaoguang GUO, Yufan JIA, Shang GAO, Renke KANG. Double-sided lapping uniformity of LiTaO3 based on three-dimensional trajectory of particles[J]. Optics and Precision Engineering, 2024, 32(13): 2081
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