• Acta Photonica Sinica
  • Vol. 44, Issue 10, 1011003 (2015)
MA Li-na*, ZHANG Jin, JIANG Shi-lei, SUN Guo-bin, YANG Guo-feng, HANG Ling-xia, MI Qian, and JI Wei
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/gzxb20154410.1011003 Cite this Article
    MA Li-na, ZHANG Jin, JIANG Shi-lei, SUN Guo-bin, YANG Guo-feng, HANG Ling-xia, MI Qian, JI Wei. Influence on Patterns Quality of Multi-beam Interference Lithography Caused by the Deviations of Incidence Azimuth Angle and Intensity of Light[J]. Acta Photonica Sinica, 2015, 44(10): 1011003 Copy Citation Text show less
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    [10] DINELLI F,MENOZZI C,BASCHIERI P,et al. Scanning probe nanoimprint lithography[J]. Nanotechnology,2010,21(7): 5305-5310.

    [12] ADAMS J,TIZAZU G,STEFAN J,et al. Large-area nanopatterning of self-assembled monolayers of alkanethiolates by interferometric lithography [J]. Langmuir,2010,26(16): 13600-13606.

    [14] JOHANNES D B,NADINE G,WITTEMANN J V,et al. Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching[J]. Nanotechnology,2010,21(9): 95302.

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    [1] LU Sen, YANG Kai-ming, ZHU Yu, ZHANG Ming, WANG Lei-jie, HU Chu-xiong. Analysis and Controller Design of Fringe Phase Locking System for Interference Lithography[J]. Acta Photonica Sinica, 2017, 46(1): 123001

    MA Li-na, ZHANG Jin, JIANG Shi-lei, SUN Guo-bin, YANG Guo-feng, HANG Ling-xia, MI Qian, JI Wei. Influence on Patterns Quality of Multi-beam Interference Lithography Caused by the Deviations of Incidence Azimuth Angle and Intensity of Light[J]. Acta Photonica Sinica, 2015, 44(10): 1011003
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