The CNx films are deposited on monocrystalline silicon by direct current glow discharge assisted pulsed laser deposition (PLD) technique under various laser fluxes. The composition, microstructure, surface morphology, mechanical and tribological properties of the films are characterized by scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), nano indenter and ball-on-disk tribometer, respectively. The results show that the films are of amorphous structure. The nitrogen atomic content of the CNx film increases from 27.7% to 34.1% with the increase of laser flux from 5.1 J/cm2 to 7.5 J/cm2. An increased area percentage of sp3C—N bond, sp2C—N bond, and a decreased area percentage of sp3C—C bond are observed in the film. An increased degree of carbon sp3 hybrid and a decreased degree of graphitization of the film are found. With the increasing of laser flux, the film hardness increases from 3.7 GPa to 5.3 GPa, the wear rate of the film decreases from 3.8×10-13 m3/(N·m) to 7.9×10-14 m3/(N·m), and the friction coefficient increases from 0.13 to 0.18, respectively.