• Chinese Journal of Lasers
  • Vol. 46, Issue 6, 0614004 (2019)
Zhiyong Tan1、2 and Juncheng Cao1、2、*
Author Affiliations
  • 1 Key Laboratory of Terahertz Solid-State Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
  • 2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/CJL201946.0614004 Cite this Article Set citation alerts
    Zhiyong Tan, Juncheng Cao. Photoelectric Characterization Technique Based on Terahertz Semiconductor Quantum-Well Devices and Its Applications[J]. Chinese Journal of Lasers, 2019, 46(6): 0614004 Copy Citation Text show less

    Abstract

    Photoelectric characterization technique is an important foundation of the terahertz technology. It covers photoelectric device characterization, spectral measurement, beam improvement, and communication and imaging applications in terahertz region, and plays an important role in terahertz application field. Firstly, the working principle and the latest progress of two kinds of terahertz semiconductor quantum devices are presented. Then, their applications in terahertz photoelectric characterization such as pulse light power measurement and detector responsivity calibration, and their applications in terahertz fast modulation and detection as well as terahertz scanning imaging systems are summarized. Finally, the improvements of the above characterization techniques are also introduced and discussed, including the methods to improve the terahertz light beam quality and the effective detection area of detectors. The potential applications of devices and characterization techniques in the future are also presented.
    Zhiyong Tan, Juncheng Cao. Photoelectric Characterization Technique Based on Terahertz Semiconductor Quantum-Well Devices and Its Applications[J]. Chinese Journal of Lasers, 2019, 46(6): 0614004
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