Using Al2O3 and AlF3, the high reflection in the deep ultraviolet band and the high transmission of the ultraviolet band to the visible band light was designed on the JGS1 substrate by the double-sided separation method. The preparation method of AlF3 evaporation rate is studied, and the influence of ion source assisted deposition technology on the absorption of coating materials in ultraviolet band is verified. The function relation between film thickness and electron beam evaporation features is established. The influence of the error is simulated with the help of the software. With the improvement of technology, the utilization rate of ultraviolet light is improved effectively. Finally, the average reflectivity of the filter film at 200～270 nm is 77.96%, and the average transmittance of 290～700 nm is 96.29%.