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    Journals >Chinese Journal of Lasers >Volume 9 >Issue 8 >Page 520 > Article
    • Chinese Journal of Lasers
    • Vol. 9, Issue 8, 520 (1982)
    An ArF excimer laser at 193 nm
    Shangguan Cheng, Yuan Cailai, Te Chao, and Dou Airong
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    Shangguan Cheng, Yuan Cailai, Te Chao, Dou Airong. An ArF excimer laser at 193 nm[J]. Chinese Journal of Lasers, 1982, 9(8): 520 Copy Citation Text show less

    Abstract

    In this paper an improved ArF excimer laser at 193 nm is reported. The single pulse output energy is over 200mj. The effect of UV-preionization on the laser output performances is discussed in detail.
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    Shangguan Cheng, Yuan Cailai, Te Chao, Dou Airong. An ArF excimer laser at 193 nm[J]. Chinese Journal of Lasers, 1982, 9(8): 520
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    Paper Information
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