Yuchao YAO, Rui ZHOU, Xing YAN, Zhenzhong WANG, Na GAO. Micron-level processing technology of microlens array (MLA) photolithography based on convolutional neural network[J]. Optics and Precision Engineering, 2024, 32(1): 43

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- Optics and Precision Engineering
- Vol. 32, Issue 1, 43 (2024)

Fig. 1. One-step laser microlens array exposure

Fig. 2. Exposure point judgement feature

Fig. 3. Structure of Yolov5 network

Fig. 4. Module structure of Yolov5 network

Fig. 5. Network module structure

Fig. 6. Indentify of exposure images

Fig. 7. Fitting curves between level of energy density during laser scanning and qualification rate

Fig. 8. Dip angle of photoresist profile

Fig. 9. Different platform moving speeds correspond to circularity of circle pattern
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Table 1. Comparison of recognition effect
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Table 2. Statistics of qualified rate of multiple parameter combinations in optimal level of energy density region during laser scanning

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