• Chinese Journal of Lasers
  • Vol. 38, Issue 4, 407001 (2011)
Zhou Yuan1、2、*, Li Yanqiu3, and Liu Guangcan1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3788/cjl201138.0407001 Cite this Article Set citation alerts
    Zhou Yuan, Li Yanqiu, Liu Guangcan. Study on Pellicle Optimization and Polarization Aberration Induced by Pellicle in Hyper Numerical Aperture Lithography[J]. Chinese Journal of Lasers, 2011, 38(4): 407001 Copy Citation Text show less
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    [2] Liao Feihong, Li Xiaoping, Chen Xuedong et al.. Probe spot position error on the accuracy of focusing and leveling measurement system[J]. Acta Optica Sinica, 2010, 30(4): 1041~1045

    [3] Ma Bin, Li Lin, Chang Jun et al.. Refractive projection lens for 90 nm resolution lithography[J]. Acta Optica Sinica, 2009, 29(s2): 211~215

    [4] Yang Xiong, Xing Tingwen. Design of extreme ultraviolet lithographic objectives[J]. Acta Optica Sinica, 2009, 29(9): 2520~2523

    [5] Zhou Yuan, Li Yanqiu. Performance analysis of double-fluid-layer achromatic ArF immersion interference lithography[J]. Chinese J. Lasers, 2010, 37(12): 3007~3012

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    [7] P. Graeupner, R. B. Garreis, A. Goehnermeier et al.. Impact of wavefront errors on low k1 processes at extremely high NA[C]. SPIE, 2003, 5040: 119~130

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    [9] J. Kye, G. Mcintyre, Y. Norihiro et al.. Polarization aberration analysis in optical lithography systems[C]. SPIE, 2006, 6154: 61511~61540

    [10] G. R. Mc, J. Kye, H. Levinson et al.. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations[J]. Journal of Microlithography, Microfabrication, and Microsystems, 2006, 5(3): 33001

    [11] M. Totzeck, P. G. Totzeck, T. Heil et al.. How to describe polarization influence on imaging (Invited Paper)[C]. SPIE, 2004, 5754: 23~37

    [12] K. Bubke, B. Alles, E. Cotte et al.. Pellicle induced aberration and apodization in hyper NA optical lithography[C]. SPIE, 2006, 6283: 628312

    [13] S. Yu. Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principlies[J]. Journal of Microlithography, Microfabrication, and Microsystems, 2005, 4(4): 043003

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    Zhou Yuan, Li Yanqiu, Liu Guangcan. Study on Pellicle Optimization and Polarization Aberration Induced by Pellicle in Hyper Numerical Aperture Lithography[J]. Chinese Journal of Lasers, 2011, 38(4): 407001
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