Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature

Shen Bin; Li Haiyuan; Xiong Huai; Zhang Xu; Tang Yongxing

doi:1002-185x(2016)s1-198-04

Journals >Collection Of theses on high power laser and plasma physics >Volume 14 >Issue 1 >Page 198 > Article

Collection Of theses on high power laser and plasma physics
Vol. 14, Issue 1, 198 (2016)

Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature

Shen Bin^1,2,*, Li Haiyuan¹, Xiong Huai¹, Zhang Xu¹, and Tang Yongxing¹

Author Affiliations

¹[in Chinese]

²[in Chinese]

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DOI: 1002-185x(2016)s1-198-04 Cite this Article

Shen Bin, Li Haiyuan, Xiong Huai, Zhang Xu, Tang Yongxing. Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature[J]. Collection Of theses on high power laser and plasma physics, 2016, 14(1): 198 Copy Citation Text

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References

[2] Suratwala T I, Hanna M L, Miller E L et al. Journal of Non-Crystalline Solids[J], 2003, 316:349

[3] Bautista M C, Morales A. Solar Energy Materials & Solar Cells [J], 2003, 80: 217

[6] Omer Kesmez，Esin Burunkaya，Nadir Kiraz et al. Journal of Non-Crystalline Solids [J], 2011, 357: 3130