• Frontiers of Optoelectronics
  • Vol. 4, Issue 2, 146 (2011)
Guangli WANG, Yi SHI*, Lijia PAN, Lin PU, Jin LV, Rong ZHANG, and Youdou ZHENG
Author Affiliations
  • School of Electronic Science and Technology, Key Laboratory of Photonic and Electronic Materials, Nanjing University, Nanjing 210093, China
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    DOI: 10.1007/s12200-011-0156-7 Cite this Article
    Guangli WANG, Yi SHI, Lijia PAN, Lin PU, Jin LV, Rong ZHANG, Youdou ZHENG. Charge trapping memory devices employing multi-layered Ge/Si nanocrystals for storage fabricated with ALD and PLD methods[J]. Frontiers of Optoelectronics, 2011, 4(2): 146 Copy Citation Text show less
    References

    [1] Tiwari S, Rana F, Hanafi H, Hartstein A, Crabbe E F, Chan K. A silicon nanocrystals based memory. Applied Physics Letters, 1996, 68(10): 1377-1379

    [2] Shi Y, Saito K, Ishikuro H, Hiramoto T. Effects of traps on charge storage characteristics in metal-oxide-semiconductor memory structures based on silicon nanocrystals. Journal of Applied Physics, 1998, 84(4): 2358-2360

    [3] Zhu Y, Zhao D T, Liu J L. Numerical investigation of transient capacitances of Ge/Si heteronanocrystal memories in retention mode. Journal of Applied Physics, 2007, 101(3): 034508

    [4] Lu J, Zuo Z, Chen Y B, Shi Y, Pu L, Zheng Y D. Charge storage characteristics in metal-oxide-semiconductor memory structure based on gradual Ge1 - xSix/Si heteronanocrystals. Applied Physics Letters, 2008, 92(1): 013105

    [5] Tan Y N, Chim W K, Choi W K, Joo M S, Cho B J. Hafnium aluminum oxide as charge storage and blocking-oxide layers in SONOS-type nonvolatile memory for high-speed operation. IEEE Transactions on Electron Devices, 2006, 53(4): 654-662

    [6] Govoreanu B, Wellekens D, Haspeslagh L, Brunco D P, De Vos J, Aguado D R, Blomme P, van der Zanden K, Van Houdt J. Performance and reliability of HfAlOx-based interpoly dielectrics for floating-gate Flash memory. Solid-State Electronics, 2008, 52(4): 557-563

    [7] Lin Y H, Chien C H, Lin C T, Chang C Y, Lei T F. Novel two-bit HfO2 nanocrystal nonvolatile flash memory. IEEE Transactions on Electron Devices, 2006, 53(4): 782-789

    [8] Lee J S, Cho J, Lee C, Kim I, Park J, Kim YM, Shin H, Lee J, Caruso F. Layer-by-layer assembled charge-trap memory devices with adjustable electronic properties. Nature Nanotechnology, 2007, 2(12): 790-795

    Guangli WANG, Yi SHI, Lijia PAN, Lin PU, Jin LV, Rong ZHANG, Youdou ZHENG. Charge trapping memory devices employing multi-layered Ge/Si nanocrystals for storage fabricated with ALD and PLD methods[J]. Frontiers of Optoelectronics, 2011, 4(2): 146
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