[1] Benyong Chen, Xiaohui Cheng, Dacheng Li. Dual-wavelength interferometric technique with subnanometric resolution [J]. Appl. Opt., 2002, 41(28):5933～5937

[2] Zhaogu Cheng, Haijun Gao, Xiongliang Chai et al.. Study on high accuracy displacement interferometer for lithography application [C]. SPIE, 2004, 5662:395～399

[3] Chunyong Yin, Guoliang Dai, Zhixia Chao et al.. Determining the residual nonlinearity of a high-precision heterodyne interferometer [J]. Opt. Eng., 1999, 38(8):1361～1365

[4] Norman Bobroff. Recent advances in displacement measuring interferometry [J]. Meas. Sci. Technol., 1993, 4:907～926

[6] Frank C. Demarest. High-resolution, high-speed, low data age uncertainty, heterodyne displacement measuring interferometer electronics [J]. Meas. Sci. Technol., 1998, 9:1024～1030

[9] Zhaogu Cheng, Haijun Gao, Zhiping Zhang et al.. Study of a dual-frequency laser interferometer with unique optical subdivision techniques [J]. Appl. Opt., 2006, 45(10):2246～2250

[10] Agilent 5529A Dynamic Calibrator Data Sheet. http://cp.literature.agilent.com/litweb/pdf/5964-9307E.pdf