• Acta Photonica Sinica
  • Vol. 50, Issue 6, 84 (2021)
Jiaxin ZHENG1、2, Bingrong GAO2、*, Yafei XUE1, Ziyi LUO1, Shanguo HAN1, Xueqing LIU2, and Qidai CHEN2
Author Affiliations
  • 1China-Ukraine Institute of Welding, Guangdong Academy of Sciences, China-Ukraine Belt and Road Joint Laboratory on Materials Joining and Advanced Manufacturing, Guangdong Provincial Key Laboratory of Advanced Welding Technology, Guangzhou50650, China
  • 2State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering,Jilin University, Changchun13001, China
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    DOI: 10.3788/gzxb20215006.0650109 Cite this Article
    Jiaxin ZHENG, Bingrong GAO, Yafei XUE, Ziyi LUO, Shanguo HAN, Xueqing LIU, Qidai CHEN. Fabrication of Sapphire Grating by Femtosecond Laser Assisted Etching(Invited)[J]. Acta Photonica Sinica, 2021, 50(6): 84 Copy Citation Text show less
    Schematic diagram of the fabrication process
    Fig. 1. Schematic diagram of the fabrication process
    SEM images of the sapphire gratings with different period
    Fig. 2. SEM images of the sapphire gratings with different period
    SEM images and cross-sectional profile of sapphire gratings with different duty cycles
    Fig. 3. SEM images and cross-sectional profile of sapphire gratings with different duty cycles
    SEM images of sapphire nano grating and microstructure of sapphire with different depth
    Fig. 4. SEM images of sapphire nano grating and microstructure of sapphire with different depth
    Comparison of sapphire grating diffraction results and diffraction efficiency of sapphire grating
    Fig. 5. Comparison of sapphire grating diffraction results and diffraction efficiency of sapphire grating
    Characterization of sapphire grating roughness and structural height changes before and after processing
    Fig. 6. Characterization of sapphire grating roughness and structural height changes before and after processing
    Jiaxin ZHENG, Bingrong GAO, Yafei XUE, Ziyi LUO, Shanguo HAN, Xueqing LIU, Qidai CHEN. Fabrication of Sapphire Grating by Femtosecond Laser Assisted Etching(Invited)[J]. Acta Photonica Sinica, 2021, 50(6): 84
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