• Chinese Journal of Lasers
  • Vol. 39, Issue s1, 107002 (2012)
Liu Wende1、*, Chen Chi1, Zhang Hang2, Guo Wei2, Yu Jing1, Fan Qiming1, and Xu Yingying1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: 10.3788/cjl201239.s107002 Cite this Article Set citation alerts
    Liu Wende, Chen Chi, Zhang Hang, Guo Wei, Yu Jing, Fan Qiming, Xu Yingying. Effect of Glass Substrate and Surface Roughness on Ellipsometric Measurement of Silicon Nitride Films[J]. Chinese Journal of Lasers, 2012, 39(s1): 107002 Copy Citation Text show less

    Abstract

    In spectroscopic ellipsometric measurement, the backside reflection of the glass substrate has great influence on the tested results. Ellipsometric measurement and model calculation are carried out for the silicon nitride film deposited on glass substrate of flat panel displays. The coherent model of the baskside reflection, i.e. "air-substrate-air" is used to calculate and obtain the refractive index of the glass substrate which agrees well with the data provided by manufacturer. Tauc Lorentz model is used in data analysis for the silicon nitride film to discuss the effect of the interface layer between the film and substrate, the surface roughness on the optical constants and model fitting. The results suggest that the inclusion of the interface is necessary for improving the degree of fitting in the case of lattice mismatch between the film and substrate. The optical constants and film structure of the film system are presented.
    Liu Wende, Chen Chi, Zhang Hang, Guo Wei, Yu Jing, Fan Qiming, Xu Yingying. Effect of Glass Substrate and Surface Roughness on Ellipsometric Measurement of Silicon Nitride Films[J]. Chinese Journal of Lasers, 2012, 39(s1): 107002
    Download Citation