• Chinese Journal of Lasers
  • Vol. 16, Issue 1, 59 (1989)
Li Ding1, Zhou Zhengzhuo1, Zheng Yongjian1, Gong Huanming1, Qiu Μingxin1, and Lin Chenglu2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    Li Ding, Zhou Zhengzhuo, Zheng Yongjian, Gong Huanming, Qiu Μingxin, Lin Chenglu. Preparation of Ni and NiSi2 films on polysilicon by laser-induced aluminothermic reaction[J]. Chinese Journal of Lasers, 1989, 16(1): 59 Copy Citation Text show less
    References

    [1] S. P. Murarka, Silicides For VLSI Applications (Academic, New York, 1983)

    [3] S. P. Murarka, J. Vac. Sci. Technol., 17, 775 (1980)

    [4] G. V. SamsoDor, Handbook of Refractory Compounds (IFI/Plenum, New York, 1980).

    [5] W. G. Moffat,in "The Handbook of Binury Phase actefrDiagrams" (General electric CO Schene-ctady, New York, 1978)

    Li Ding, Zhou Zhengzhuo, Zheng Yongjian, Gong Huanming, Qiu Μingxin, Lin Chenglu. Preparation of Ni and NiSi2 films on polysilicon by laser-induced aluminothermic reaction[J]. Chinese Journal of Lasers, 1989, 16(1): 59
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