• Opto-Electronic Engineering
  • Vol. 43, Issue 1, 65 (2016)
ZHANG Man, DENG Qiling, LI Zhiwei, PANG Hui, SHI Lifang, CAO A′xiu, and HU Song
Author Affiliations
  • [in Chinese]
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    DOI: 10.3969/j.issn.1003-501x.2016.01.012 Cite this Article
    ZHANG Man, DENG Qiling, LI Zhiwei, PANG Hui, SHI Lifang, CAO A′xiu, HU Song. Method to Fabricate Subwavelength Grating Based on Thiol-ene[J]. Opto-Electronic Engineering, 2016, 43(1): 65 Copy Citation Text show less

    Abstract

    Based on the special optical properties of the subwavelength grating, a fabrication method of thiol-ene subwavelength grating is presented. An elastic PDMS subwavelength grating was used as the imprint mold and thiol-ene was the imprint resist. Using the UV-curable soft-lithogaphy, thiol-ene subwavelength grating was fabricated, which included a PMMA film as the waveguide layer. The thiol-ene subwavelength grating with the period of 300 nm was stimulated and fabricated using this method. The experimental results show that the thiol-ene subwavelength grating could reflect the blue light with wavelength ranged from 448 nm~482 nm at a specific angle, which were consistent with the simulation results. The results indicate that the method proposed in this article could effectively fabricate the subwavelength grating structure. Furthermore, the method is simple, low-cost, and easy to high throughput, which has broad application prospects in the preparation of micro and nano structures.
    ZHANG Man, DENG Qiling, LI Zhiwei, PANG Hui, SHI Lifang, CAO A′xiu, HU Song. Method to Fabricate Subwavelength Grating Based on Thiol-ene[J]. Opto-Electronic Engineering, 2016, 43(1): 65
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