Fig. 1. Flow chart of the whole experiment.

Fig. 2. Results of lithography: (a), (b) Surface morphology under optical microscope and cross section under scanning electron microscope when the element size is 12.94 μm; (c), (d) surface morphology under optical microscope and cross section under scanning electron microscope when the element size is 13.97 μm.

Fig. 3. Schematic diagram of lithographic pattern structure.

Fig. 4. Electroplating experiment results: (a) Surface under scanning electron microscope; (b) cross section under scanning electron microscope.

Fig. 5. Etching rate experimental results: (a) Relationship between etching rate and antenna power; (b) relationship between etching rate and bias power; (c) relationship between etching rate and etching gas flow ratio.

Fig. 6. Etching results: (a) Surface morphology of high density array; (b) cross section morphology of high density array; (c) cross section morphology of conical array; (d) the surface morphology of deep etching of high density surface array.

Fig. 7. Structure of different scale areas under the piezoelectric microscope: (a) Surface morphology of 30 μm × 30 μm area; (b) out of plane amplitude of 30 μm × 30 μm area; (c) phase of 30 μm × 30 μm area; (d) surface morphology of 5 μm × 5 μm area; (e) out of plane amplitude of 5 μm × 5 μm area; (f) phase of 5 μm × 5 μm area; (g) surface morphology of 1 μm × 1 μm area; (h) out of plane amplitude of 1 μm × 1 μm area; (i) phase of 1 μm × 1 μm area.

Fig. 8. Results of 1 μm × 1 μm area under the piezoelectric force microscope: (a) Out of plane amplitude at ± 10 V; (b) phase at ± 10 V; (c) out of plane amplitude at ± 20 V; (d) phase at ± 20 V; (e) out of plane amplitude at ± 30 V; (f) phase at ± 30 V.

Fig. 9. Electric field induced amplitude and phase evolution in situ in the 1 μm × 1 μm area at room temperature