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    Journals >Chinese Journal of Lasers >Volume 10 >Issue 3 >Page 136 > Article
    • Chinese Journal of Lasers
    • Vol. 10, Issue 3, 136 (1983)
    CW CO2 laser annealing of arsenic implanted silicon
    Lin Chenglu1, Lin Zixin1, Zou Shichang1, Fan Baohua2, and Wu Hengxian3
    Author Affiliations
  • 1[in Chinese]
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    Lin Chenglu, Lin Zixin, Zou Shichang, Fan Baohua, Wu Hengxian. CW CO2 laser annealing of arsenic implanted silicon[J]. Chinese Journal of Lasers, 1983, 10(3): 136 Copy Citation Text show less
    References

    [1] S. C. Tsou et al., Appl. Phys., 1980, 23, 163.

    [2] C. W. White et al., J. Appl. Phys., 1979, 50, 3261.

    [3] H. F. Wolf; Silicon Semiconductor Data, 1969, Pergamon Press, New York, p. 136.

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    Lin Chenglu, Lin Zixin, Zou Shichang, Fan Baohua, Wu Hengxian. CW CO2 laser annealing of arsenic implanted silicon[J]. Chinese Journal of Lasers, 1983, 10(3): 136
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