• Optoelectronics Letters
  • Vol. 10, Issue 1, 24 (2014)
Man-man TIAN1, Jia-jia MI1, Jian-ping SHI1、*, Nan-nan WEI1, Ling-li ZHAN1, Wan-xia HUANG1, Ze-wen ZUO1, Chang-tao WANG2, and Xian-gang LUO2
Author Affiliations
  • 1College of Physics and Electronic Information, Anhui Normal University, Wuhu 241000, China
  • 2State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese
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    DOI: 10.1007/s11801-014-3172-1 Cite this Article
    TIAN Man-man, MI Jia-jia, SHI Jian-ping, WEI Nan-nan, ZHAN Ling-li, HUANG Wan-xia, ZUO Ze-wen, WANG Chang-tao, LUO Xian-gang. 248 nm imaging photolithography assisted by surface plasmon polariton interference[J]. Optoelectronics Letters, 2014, 10(1): 24 Copy Citation Text show less
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    TIAN Man-man, MI Jia-jia, SHI Jian-ping, WEI Nan-nan, ZHAN Ling-li, HUANG Wan-xia, ZUO Ze-wen, WANG Chang-tao, LUO Xian-gang. 248 nm imaging photolithography assisted by surface plasmon polariton interference[J]. Optoelectronics Letters, 2014, 10(1): 24
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