• Semiconductor Optoelectronics
  • Vol. 42, Issue 5, 672 (2021)
LI Pengcheng1,2, FENG Xianying1,2, LI Peigang1,2, LI Hui1,2, and ZONG Yanmin3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • show less
    DOI: 10.16818/j.issn1001-5868.2021071201 Cite this Article
    LI Pengcheng, FENG Xianying, LI Peigang, LI Hui, ZONG Yanmin. Study on Growth Environment of Large Size SiC Single Crystal[J]. Semiconductor Optoelectronics, 2021, 42(5): 672 Copy Citation Text show less
    References

    [5] Rost H-J, Siche D, Dolle J, et al. Influence of different growth parameters and related conditions on 6H-SiC crystals grown by the modified Lely method[J]. Materials Science and Engineering B, 1999, 61-62: 68-72.

    [6] Schulze N, Barrett D L, Pensl G. Near-equilibrim growth of micropipe-free 6H-SiC single crystals by physical vapor transport[J]. Appl. Phys. Lett., 1998, 72(13): 1632-1634.

    [7] Segal A S, Vorobev A N, Karpov S Y, et al. Growth of silicon carbide by sublimation sandwich method in the atmosphere of inert gas[J]. J. of Crystal Growth, 2000, 208(1/4): 431-441.

    [8] Lilov S K. Study of the equilibrium process in the gas phase during silicon carbide sublimation[J]. Materials Science and Engineering, 1993, 21(1): 65-69.

    [9] Hofmann D, Heinze M, Winnacker A, et al. On the sublimation growth of SiC bulk crystals: development of a numerical process model[J]. J. of Crystal Growth, 1995, 146(1/4): 214-219.

    [10] Bubner N, Klein O, Philip P, et al. A transient model for the sublimation growth of silicon carbide single crystals[J]. J. of Crystal Growth, 1999, 205(3): 294-304.

    [11] Chen Q S, Zhang H, Ma R H, et al. Modeling of transport process and kinetics of silicon carbide bulk growth[J]. J. of Crystal Growth, 2001, 225(2/4): 229-306.

    [15] Chen Q S, Yan J Y, Prasad V. Application of flow-kinetics model to the PVT growth of SiC crystals[J]. J. of Crystal Growth, 2007, 303(1): 357-361.