• Acta Photonica Sinica
  • Vol. 48, Issue 1, 131002 (2019)
FENG Shi1、2、*, FU Xiu-hua1, WANG Da-sen2, LI Xiao-jing2, NIE Feng-ming2, and ZHANG Xu2、3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3788/gzxb20194801.0131002 Cite this Article
    FENG Shi, FU Xiu-hua, WANG Da-sen, LI Xiao-jing, NIE Feng-ming, ZHANG Xu. Study on Planarization Layer Uniformity of Large-aperture Optical Elements Based on Ion Beam Sputtering[J]. Acta Photonica Sinica, 2019, 48(1): 131002 Copy Citation Text show less
    References

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    [2] BUNDESMANN C, LAUTENSCHLGER T, THELANDER E, et al. Reactive Ar ion beam sputter deposition of TiO2, films: influence of process parameters on film properties[J]. Nuclear Instruments & Methods in Physics Research, 2017, 395: 17-23.

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    [7] FU Xiu-hua, YANG Yong-liang, LIU Guo-jun, et al. Study on the uniformity of diamond-like carbon films on a large hood[J].Infrared and Laser Engineering,2013, 42(1): 181-184.

    [8] ORTIZ T, CONDE C, KHAN T M, et al. Thickness uniformity and optical/structural evaluation of RF sputtered ZnO thin films for solar cell and other device applications[J]. Applied Physics A, 2017, 123(4): 280-286.

    [9] CHEN Gui-yang, XIE Xu-hui, ZHOU Lin, et al. Study on the removal function and stability of radiofrequency ion source in optical processing[J]. Aeronautical Precision Manufacturing Technology, 2016, 52(5): 19-22.

    [10] ZHAO Miao, LEI Guang-jiu, LI Ming, et al. Analysis of beam characteristics of the radio frequency ion source[J]. Nuclear Fusion and Plasma Physics, 2018, 38(2): 152-157.

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    [12] MENG Meng ,WU Wen-ge, ZHANG Yong, et al. Optimization of process parameters of sputtered thin films based on response surface methodology[J]. Tool Technology, 2017, 51(7): 24-27.

    [13] LI Ling-hui, XIONG Sheng-ming, SHEN Lin, et al. Experiment of film thickness uniformity by ion beam sputtering deposition of optical thin films[J]. Optoelectronic Engineering, 2004, 31(s1): 67-69.

    [14] ORTIZ T, CONDE C, KHAN T M, et al. Thickness uniformity and optical/structural evaluation of RF sputtered ZnO thin films for solar cell and other device applications[J]. Applied Physics A, 2017, 123(4): 280-286.

    [15] DHAWAN R, RAI S, LODHA G S. Effect of ion beam energy on density, roughness & uniformity of Co film deposited using ion beam sputteringsystem[C]. American Institute of Physics, 2012: 691-692.

    FENG Shi, FU Xiu-hua, WANG Da-sen, LI Xiao-jing, NIE Feng-ming, ZHANG Xu. Study on Planarization Layer Uniformity of Large-aperture Optical Elements Based on Ion Beam Sputtering[J]. Acta Photonica Sinica, 2019, 48(1): 131002
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