[2] BUNDESMANN C, LAUTENSCHLGER T, THELANDER E, et al. Reactive Ar ion beam sputter deposition of TiO2, films: influence of process parameters on film properties[J]. Nuclear Instruments & Methods in Physics Research, 2017, 395: 17-23.
[3] HUANG Jun-jun, GUI Cheng-mei, DING Ming, et al. Effect of assisted-ion-beam gases on the structure of amorphous silicon thin films prepared by ion-beam-assisted sputtering[J]. Materials Science Forum, 2016, 852: 1102-1107.
[4] KIONTKE S, ALLENSTEIN F. Ion-beam figuring (IBF) for high-precision optics becomes affordable[C]. SPIE, 2010, 7786: 77860F.
[5] ARKWRIGHT J, BURKE J, GROSS M. A deterministic optical figure correction technique that preserves precision-polished surfacequality[J]. Optics Express, 2008, 16(18): 13901-13907.
[6] TANG Wa. Research on removal model and technology for ion beam figuring large aspherical mirror[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2016.
[7] FU Xiu-hua, YANG Yong-liang, LIU Guo-jun, et al. Study on the uniformity of diamond-like carbon films on a large hood[J].Infrared and Laser Engineering,2013, 42(1): 181-184.
[8] ORTIZ T, CONDE C, KHAN T M, et al. Thickness uniformity and optical/structural evaluation of RF sputtered ZnO thin films for solar cell and other device applications[J]. Applied Physics A, 2017, 123(4): 280-286.
[9] CHEN Gui-yang, XIE Xu-hui, ZHOU Lin, et al. Study on the removal function and stability of radiofrequency ion source in optical processing[J]. Aeronautical Precision Manufacturing Technology, 2016, 52(5): 19-22.
[10] ZHAO Miao, LEI Guang-jiu, LI Ming, et al. Analysis of beam characteristics of the radio frequency ion source[J]. Nuclear Fusion and Plasma Physics, 2018, 38(2): 152-157.
[11] GUO Cheng-jun, PEI Ning, WANG Da-sen, et al. The technique of ion beam etching polishing[J]. Applied Mechanics & Materials, 2013, 395-396: 1066-1070.
[12] MENG Meng ,WU Wen-ge, ZHANG Yong, et al. Optimization of process parameters of sputtered thin films based on response surface methodology[J]. Tool Technology, 2017, 51(7): 24-27.
[13] LI Ling-hui, XIONG Sheng-ming, SHEN Lin, et al. Experiment of film thickness uniformity by ion beam sputtering deposition of optical thin films[J]. Optoelectronic Engineering, 2004, 31(s1): 67-69.
[14] ORTIZ T, CONDE C, KHAN T M, et al. Thickness uniformity and optical/structural evaluation of RF sputtered ZnO thin films for solar cell and other device applications[J]. Applied Physics A, 2017, 123(4): 280-286.
[15] DHAWAN R, RAI S, LODHA G S. Effect of ion beam energy on density, roughness & uniformity of Co film deposited using ion beam sputteringsystem[C]. American Institute of Physics, 2012: 691-692.