• Optics and Precision Engineering
  • Vol. 29, Issue 11, 2556 (2021)
Chang-cai CUI*, Cheng YANG, Zi-qing LI, and Bu-gang XUE
Author Affiliations
  • Institute of Manufacturing Engineering, Huaqiao University, Xiamen361021, China
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    DOI: 10.37188/OPE.20212911.2556 Cite this Article
    Chang-cai CUI, Cheng YANG, Zi-qing LI, Bu-gang XUE. Measuring and evaluating system for surface morphology of sapphire substrates[J]. Optics and Precision Engineering, 2021, 29(11): 2556 Copy Citation Text show less
    Measuring points of sapphire in different sizes and path planning
    Fig. 1. Measuring points of sapphire in different sizes and path planning
    Principle of vertical scanning white light interference technology
    Fig. 2. Principle of vertical scanning white light interference technology
    Principle for autofocus judgement
    Fig. 3. Principle for autofocus judgement
    Workflow of focusing algorithm
    Fig. 4. Workflow of focusing algorithm
    Workflow of sapphire substrate surface topography measurement and evaluation system
    Fig. 5. Workflow of sapphire substrate surface topography measurement and evaluation system
    Photo of sapphire substrate surface topography measurement system
    Fig. 6. Photo of sapphire substrate surface topography measurement system
    Physical drawing of Ra standard parts
    Fig. 7. Physical drawing of Ra standard parts
    Fitting results for error compensation
    Fig. 8. Fitting results for error compensation
    Contrast experiment with Zygo7300 3D optical profilometer
    Fig. 9. Contrast experiment with Zygo7300 3D optical profilometer
    Measurement result of surface profile contrast experiment
    Fig. 10. Measurement result of surface profile contrast experiment
    Analysis of focusing algorithm
    Fig. 11. Analysis of focusing algorithm
    Three-dimensional topography of position 3
    Fig. 12. Three-dimensional topography of position 3
    Two-dimensional evaluation parameters of 2-inch sapphire substrate
    Fig. 13. Two-dimensional evaluation parameters of 2-inch sapphire substrate
    Three-dimensional evaluation parameters of 2-inch sapphire substrate
    Fig. 14. Three-dimensional evaluation parameters of 2-inch sapphire substrate
    Two-dimensional evaluation parameters of 4-inch sapphire substrate
    Fig. 15. Two-dimensional evaluation parameters of 4-inch sapphire substrate
    Three-dimensional evaluation parameters of 4-inch sapphire substrate
    Fig. 16. Three-dimensional evaluation parameters of 4-inch sapphire substrate
    NumberStandard part
    Ra=0.1 μmRa=0.2 μmRa=0.4 μmRa=0.8 μm
    10.0250.0550.1150.243
    20.0270.0580.1260.232
    30.0290.0570.1150.222
    40.0280.0580.1170.236
    50.0290.0590.1140.229
    60.0280.0560.1160.234
    70.0280.0570.1140.223
    80.0270.0650.1160.243
    90.0270.0580.1240.229
    100.0280.0550.1060.234
    Table 1. Measurement data of four Ra standard parts
    Chang-cai CUI, Cheng YANG, Zi-qing LI, Bu-gang XUE. Measuring and evaluating system for surface morphology of sapphire substrates[J]. Optics and Precision Engineering, 2021, 29(11): 2556
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