• Chinese Journal of Lasers
  • Vol. 33, Issue 6, 800 (2006)
[in Chinese]*, [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Measurement of Profile Parameters of Holographic Photoresist Grating Mask Made on Top of Chrome Stack in Spectroscopic Way[J]. Chinese Journal of Lasers, 2006, 33(6): 800 Copy Citation Text show less
    References

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    [8] S. Sohail H. Naqvi, John R. McNeil, Richard H. Krukar et al.. Grating parameter estimation using scatterometry [C]. SPIE, 1993, 1992:170~180

    [9] Conrad, Edward W. Paul, David P. et al.. Method and apparatus for measuring the profile of small repeating lines [P]. United States Patent 5,329,963, 1999

    [10] Hsu-Ting Huang, Fred L. Terry Jr.. Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring [J]. Thin Solid Films, 2004, 455-456:828~836

    [11] Xinhui Niu, Nickhill Jakatdar, Junwei Bao et al.. Specular spectropic scatterometry [J]. Transactions on Semiconductor Manufacturing, 2001, 14(2):97~111

    [12] Susan M. Gaspar Wilson, S. Sohail H. Naqvi, John R. McNeil et al.. Metrology of etched quartz and chrome embedded phase shift gratings using scatterometry [C]. SPIE, 1995, 2439:479~494

    [13] John R.Marciante, Nestor O. Farmiga, Jeffrey I. Hirsh et al.. Optical measurement of depth and duty cycle for binary diffraction gratings with subwave length features [J]. Appl. Opt., 2003, 42(16): 3234~3240

    [14] M. G. Moharam, Drew A. Pommet, Eric B. Grann. Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced trasmittance matrix approach [J]. J. Opt. Soc. Am. A, 1995, 12(5):1077~1086

    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Measurement of Profile Parameters of Holographic Photoresist Grating Mask Made on Top of Chrome Stack in Spectroscopic Way[J]. Chinese Journal of Lasers, 2006, 33(6): 800
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