The ZrO2/SiO2 multilayer thin films deposited by electron beam are studied by high-low temperature alternating experiment under different environmental conditions. The results of scanning electron microscope (SEM) and X-ray diffraction (XRD) show that there is no crystal forming and no change in layer structure before and after temperature test. The transmission spectrum, surface morphology and laser induced damage threshold (LIDT) are acquired by measurement before and after the high-low temperature environmental test and then are analyzed. The results show that after high-low temperature experiment, the spectral transmissivity of thin film components at the center of wavelengths declines, as well as LIDT, and surface deformation develops sag direction.