Deposition and Absolute Reflectivity Measurements of a Mo/Si Multilayer for 13.1 nm Soft X ray at 45&#176; Incidence Angle

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 25 >Issue 6 >Page 565 > Article

Chinese Journal of Lasers
Vol. 25, Issue 6, 565 (1998)

Deposition and Absolute Reflectivity Measurements of a Mo/Si Multilayer for 13.1 nm Soft X ray at 45° Incidence Angle

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Deposition and Absolute Reflectivity Measurements of a Mo/Si Multilayer for 13.1 nm Soft X ray at 45° Incidence Angle[J]. Chinese Journal of Lasers, 1998, 25(6): 565 Copy Citation Text

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Abstract

Reported here is a result of absolute reflectivity measurement carried out in a soft X-ray laser plasma experiment. A 26.2% reflectivity Mo/Si multilayer for 13.1 nm soft X-ray at the 45° incidence angle is obtained.

Keywords

absolute reflectivity measurement reflectivity soft X-ray multilayer

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