• Chinese Journal of Lasers
  • Vol. 31, Issue 9, 1036 (2004)
[in Chinese]1、2、*, [in Chinese]2, [in Chinese]2, [in Chinese]2, [in Chinese]2, [in Chinese]2, [in Chinese]2, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on Short Pulse Width XeCl Laser[J]. Chinese Journal of Lasers, 2004, 31(9): 1036 Copy Citation Text show less

    Abstract

    A high pressure, short pulse duration XeCl laser was fabricated, and laser parameters were measured. Aiming at large volume and high gas pressure, the laser system adopted the ultraviolet preionization to produce glow discharge. The result was that the nano-second (ns) discharge pumped 308 nm excimer laser was realized in proportion of HCl:Xe:He=0.1%:1%:98.9% with the output pulse energy of 530 mJ and the minimal pulse duration of 13 ns. The rectangle facula is 2 cm×1 cm, the beam divergence is 3 mrad, and the maximal repetition frequency is 5 Hz.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on Short Pulse Width XeCl Laser[J]. Chinese Journal of Lasers, 2004, 31(9): 1036
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