• Chinese Journal of Lasers
  • Vol. 38, Issue 9, 907002 (2011)
Wan Xiaojing*, Wang Li, Chen Jiangbo, Su Xueqiong, and Kong Le
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  • [in Chinese]
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    DOI: 10.3788/cjl201138.0907002 Cite this Article Set citation alerts
    Wan Xiaojing, Wang Li, Chen Jiangbo, Su Xueqiong, Kong Le. Effect of Variable Partial Pressure of Oxygen for SrTiO3 Thin Films Using Pulsed Laser Deposition[J]. Chinese Journal of Lasers, 2011, 38(9): 907002 Copy Citation Text show less

    Abstract

    SrTiO3(STO) thin films are manufactured on LaAlO3 (100) substrates by pulsed laser deposition (PLD) with different partial pressures of oxygen. The films′ microstructure, surface morphology and optical characteristics are characterized. In accordance with the above results, the partial pressures of oxygen is an important process parameter for the preparation of STO thin films by PLD. With decreasing partial pressure of oxygen, the crystallinity of the thin films has ameliorated, and the structure changes from cubic to tetragonal. Film grain size gradually increases, film grain number and film thickness decrease when the partial pressure of oxygen rises. The STO films present a low optical absorption in the 400~2500 nm wavelength range. The band gap energy of the STO films deposited at 5, 10 and 15 Pa are 3.84, 4.13 and 4.05 eV, respectively. This can provide good experimental data to the further analysis of STO thin films.
    Wan Xiaojing, Wang Li, Chen Jiangbo, Su Xueqiong, Kong Le. Effect of Variable Partial Pressure of Oxygen for SrTiO3 Thin Films Using Pulsed Laser Deposition[J]. Chinese Journal of Lasers, 2011, 38(9): 907002
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