[3] DONG L L,XIONG J W,WAN Q H. Development of photoelectric rotary encoders[J]. Opt. Precision Eng.,2000,8(2):198-202. (in Chinese)
[6] ZHAO L X,HU S,WANG SH ZH,et al.. A novel fabrication of photoelectrical encoder by laser focus scanning fan-mask[J]. Microfabrication Technology,2007,(6):8-11. (in Chinese)
[8] LI S H. Analysis of produce status of polycarbonate at home and abroad[J]. Anhui Chemical Industry,2009,35(1):11-13. (in Chinese)
[9] ZHOU W B,QIAN J SH,YANG H Y. Preparation and investigation of the porous PC antireflection film[J]. Journal of Anhui University Natural Science Edition,2008,32(6):82-85. (in Chinese)
[10] SUN Y J. Analysis of polycarbonate production statement in world [J]. Contemporary Chemical Industry,2008,37(1):96-99. (in Chinese)
[11] FU Y Q, ZHAO J L. Analysis of effect on uniformity of photoresist layer in spin coating[J]. Opt. Precision Eng.,1996,4(2):94-97. (in Chinese)
[12] CHEN Y,ZHANG X C. Vacuum plating Cr technics on code disc and radial grating[J]. Journal of Changchun University of Science and Technology,2005,28(1):103-105. (in Chinese)