• Chinese Journal of Lasers
  • Vol. 10, Issue 7, 399 (1983)
Chen Jianwen, Xia Kangmin, Liu Miaohong, Li Liquan, and Fu Shufen
Author Affiliations
  • [in Chinese]
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    Chen Jianwen, Xia Kangmin, Liu Miaohong, Li Liquan, Fu Shufen. Discharge characteristics of XeCl lasers[J]. Chinese Journal of Lasers, 1983, 10(7): 399 Copy Citation Text show less
    References

    [1] A. J. Schwab, F. W. HolliBger; IEEE J. Quant. Electr., 1976, QE-12, No. 3,183.

    [2] C. P. Wang; Rev. Sci. Instrum., 1976, 47, No. 1, 92.

    [3] R. C. Sze, Τ. B. Loreej IEEE J. Qucmt. Electr., 1978, QE-14, No. 12, 944.

    [4] Chen Jianwen et al.; Appl. Phys. Lett., 1980, 37, 883.

    [7] A. E. Greene, C. A. Brau; IEEE J. Quant. Electr., 1978,QE-14, No. 1, 951.

    Chen Jianwen, Xia Kangmin, Liu Miaohong, Li Liquan, Fu Shufen. Discharge characteristics of XeCl lasers[J]. Chinese Journal of Lasers, 1983, 10(7): 399
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