• Journal of Advanced Dielectrics
  • Vol. 15, Issue 1, 2450009 (2025)
Armen Poghosyan*, Ruben Hovsepyan, and Hrachya Mnatsakanyan
Author Affiliations
  • Institute for Physical Research, Ashtarak 0203, Armenia
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    DOI: 10.1142/S2010135X24500097 Cite this Article
    Armen Poghosyan, Ruben Hovsepyan, Hrachya Mnatsakanyan. Thin film field-effect transistor with ZnO:Li ferroelectric channel[J]. Journal of Advanced Dielectrics, 2025, 15(1): 2450009 Copy Citation Text show less
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    [17] R. K. Hovsepyan, N. R. Aghamalyan, E. A. Kafadaryan, A. A. Arakelyan, G. G. Mnatsakanyan, S. I. Petrosyan. Electric noise in field-effect transistors based on ZnO:Li films. J. Contemp. Phys., 55, 157(2020).

    Armen Poghosyan, Ruben Hovsepyan, Hrachya Mnatsakanyan. Thin film field-effect transistor with ZnO:Li ferroelectric channel[J]. Journal of Advanced Dielectrics, 2025, 15(1): 2450009
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