Author Affiliations
1School of Electronic and Information Engineering, Liaoning Technical University, Huludao 125105, Liaoning , China2Liaoning Key Laboratory of Ridio Frequency and Big Data for Intelligent Application, Huludao 125105, Liaoning , Chinashow less
Fig. 1. Three-dimensional structural and cross-sectional diagrams of the structured light projection chip. (a) Three-dimensional structural diagram; (b) cross-sectional diagram
Fig. 2. Schematics of the metasurface array and nanopillar structure diagram. (a) Schematic of the metasurface array; (b) nanopillar structure diagram
Fig. 3. Hybrid coded structured light patterns
Fig. 4. Flowchart of GS algorithm
Fig. 5. Schematic of electrostatically driven comb structure
Fig. 6. Simulation of metasurface nanopillars. (a) Conversion efficiency of metasurface nanopillar dimensions to incident light versus incident wavelength; (b) relationship between rotation angle of metasurface nanopillars with normalized phase of incident light
Fig. 7. Phase of mixed coding structured light stripes
Fig. 8. Gray code and phase-shifted strips projected by metasurface units. (a) Gray code strips; (b) phase-shifted strips
Fig. 9. Light intensity distribution of Gray code strips. (a) Normalized optical intensity distribution along x-axis of Gray code strips; (b) envelope of the normalized optical intensity distribution
Fig. 10. Light intensity distribution of phase-shifted strips. (a) Normalized optical intensity distribution of phase-shifted strips; (b) fit curves of the normalized optical intensity distribution in the central region
Fig. 11. Relationship between displacement and drive voltage of 2D scanning platform
Fig. 12. Displacement and stress cloud maps. (a) Displacement cloud map of device layer 1; (b) stress cloud map of device layer 1; (c) displacement cloud map of device layer 2; (d) stress cloud map of device layer 2
Fig. 13. Modal results. (a) First mode; (b) second mode; (c) third mode; (d) fourth mode
Fig. 14. Response characteristics of 2D MEMS scanning platform
Fig. 15. Design of the chip's projection scheme. (a) Switching trajectory of metasurface unit; (b) driving voltage of the electrodes for 2D scanning platform
Fig. 16. Displacement change trajectory of the 2D scanning platform (a‒f denote metasurfaces)
Fig. 17. Preparation flowchart of metasurface array
Fig. 18. Preparation flowchart of MEMS 2D scanning platform integrated metasurface array
Parameter | Value |
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Comb length(lcmob)/μm | 140 | Comb thickness(hcomb)/μm | 40 | Comb width(tcomb)/μm | 3 | Overlap length(xcomb)/μm | 40 | Comb spacing(gcomb)/μm | 2.7 | Comb teeth count of device layer 1(n1)/pair | 320 | Comb teeth count of device layer 2(n2)/pair | 568 |
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Table 1. Driving comb parameters of MEMS 2D scanning platform
Device layer number | Serpentine beam parameter | Value |
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1 | Beam length(lbeam1)/μm | 125 | Beam thickness(hbeam1)/μm | 3 | Beam width(tbeam1)/μm | 40 | Number of beams(n3) | 11 | 2 | Beam length(lbeam2)/μm | 120 | Beam thickness(hbeam2)/μm | 3.3 | Beam width(tbeam2)/μm | 40 | Number of beams(n4)/ | 11 |
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Table 2. Parameters of serpentine beams in device layers 1 and 2
Mode | Frequency /Hz |
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First | 511.91 | Second | 837.06 | Third | 1011.30 | Fourth | 1047.20 |
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Table 3. Frequencies of the first four orders of modals of the MEMS 2D scanning stage