[1] LI L, ZHANG J Y, YANG T CH, et al.. Fabrication and properties of SF6 sensor based on silicon tips array ［J］. Instrument Technique and Sensor, 2017(7): 15-19.(in Chinese)
[2] MINH P N, TAKAHITO O, MASAYOSHI E, et al.. Fabrication of Silicon Microprobes for Optical Near-field Applications ［M］. CRC Press, 2018.
[4] GU C Y. Preparation of Metallic Micro/nano-structures on the Surface of Crystalline Silicon and Their Surface Enhanced Raman Scattering Properties ［D］. Kunming: Yunnan Normal University, 2019.(in Chinese)
[6] Liu W W, L B, CHANG Y H, et al.. The study of anisotropic etching characteristics of silicon in MEMS ［J］. Equipment for Electronic Products Manufacturing, 2018, 47(4): 14-17. (in Chinese)
[7] LEE D B. Anisotropic etching of silicon ［J］. Journal of Applied Physics, 1969, 40(11): 4569-4574.
[8] HAMDANA G, PURANTO P, LANGFAHL-KLABES J, et al.. Nanoindentation of crystalline silicon pillars fabricated by soft UV nanoimprint lithography and cryogenic deep reactive ion etching ［J］. Sensors and Actuators A: Physical, 2018, 283: 65-78.
[9] SHIN Y, KIM Y, LEE S, et al.. Single-mask fabrication of micro-probe electrode array with various tip heights and sharpness using isotropic and anisotropic etching ［J］. Micro & Nano Letters, 2018, 13(9): 1245-1247.
[10] RESNIK D, VRTACNIK D, ALJANCIC U, et al.. Different aspect ratio pyramidal tips obtained by wet etching of (100) and (111) silicon ［J］. Microelectronics Journal, 2003, 34(5-8): 591-593.
[11] SHI E L, CUI Y, XIA J S, et al.. Fabrication of nano-silicon-tips based on anisotropic wet etching technique ［J］. Micronanoelectronic Technology, 2008, 45(12): 724-728.(in Chinese)
[13] HAN J Q, LU S Y, LI Q, et al.. Anisotropic wet etching silicon tips of small opening angle in KOH solution with the additions of I2/KI ［J］. Sensors and Actuators A Physical, 2009, 152(1): 75-79.
[14] BURT D P, DOBSON P S, DONALDSON L, et al.. A simple method for high yield fabrication of sharp silicon tips ［J］. Microelectronic Engineering, 2008, 85(3): 625-630.
[15] LI J D, XIE J, XUE W, et al.. Fabrication of cantilever with self-sharpening nano-silicon-tip for AFM applications ［J］. Microsystem Technologies, 2013, 19(2): 285-290.
[16] ZHU F SH, XIA N J, ZHAO B J, et al.. Research on technology of improving silicon etching uniformity by wet etching ［J］. Equipment for Electronic Products Manufacturing, 2019, 48(5): 13-16.(in Chinese)
[17] ZHANG X S, LIU J, WANG B, et al.. Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching ［J］. AIP Advances, 2014, 4(3): 916.
[18] LINDQUIST N C, NAGPAL P, MCPEAK K M, et al.. Engineering metallic nanostructures for plasmonics and nanophotonics ［J］. Reports on Progress in Physics, 2012, 75(3): 036501.
[19] HENZIE J, KWAK E S, ODOM T W. Mesoscale metallic pyramids with nanoscale tips ［J］. Nano Letters, 2005, 5(7): 1199-1202.
[20] SUN C H, LINN A C, JIANG P. Templated fabrication of periodic metallic nanopyramid arrays ［J］. Chemistry of Materials, 2007, 19(18): 4551-4556.
[21] JOHNSON T W, LAPIN Z J, BEAMS R, et al.. Highly reproducible near-field optical imaging with sub-20-nm resolution based on template-stripped gold pyramids ［J］. ACS Nano, 2012, 6(10): 9168-9174.
[22] CHERUKULAPPURATH S, JOHNSON T W, LINDQUIST N C, et al.. Template-stripped asymmetric metallic pyramids for tunable plasmonic nanofocusing ［J］. Nano Letters, 2013, 13(11): 5635-5641.
[25] BEAN K E, BEAN K E. Anisotropic etching of silicon ［J］. IEEE Transactions on Electron Devices, 1978, 25(10): 1185-1193.
[26] TANG B, YUAN M Q, PENG B, et al.. Development of the anisotropic wet etching on the single-crystalline silicon ［J］.Micronano-electronic Technology, 2013, 50(5): 327-333.(in Chinese)
[27] NIELSEN C B, CHRISTENSEN C, PEDERSEN C, et al.. Particle precipitation in connection with KOH etching of silicon ［J］. Journal of the Electrochemical Society, 2004, 151(5): G338-G342.
