Thin Films Thickness Calculation of Vanadium Dioxide Using as Laser Protection Material

Tian Xuesong; Liu Jincheng; Li Lianjiang; Liu Jinbo; Wang Qi

Journals >Chinese Journal of Lasers >Volume 35 >Issue s1 >Page 161 > Article

Chinese Journal of Lasers
Vol. 35, Issue s1, 161 (2008)

Thin Films Thickness Calculation of Vanadium Dioxide Using as Laser Protection Material

Tian Xuesong^*, Liu Jincheng, Li Lianjiang, Liu Jinbo, and Wang Qi

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[in Chinese]

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Tian Xuesong, Liu Jincheng, Li Lianjiang, Liu Jinbo, Wang Qi. Thin Films Thickness Calculation of Vanadium Dioxide Using as Laser Protection Material[J]. Chinese Journal of Lasers, 2008, 35(s1): 161 Copy Citation Text

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References

[2] Ch. Fabjan, J. Garche, B. Harrer et al.. The vanadium redox-battery: an efficient storage unit for photovoltaic systems[J]. Electrochimica Acta, 2001, 47(5): 825～831

[8] Yi Li, Xinjian Yi, Tianxu Zhang. Nanostructure and thermal-optical properties of vanadium dioxide thin films[J]. Chinese Opt. Lett., 2005, 3(12): 719～721

[9] Francine C Case. Improved VO2 thin films for infrared switching[J]. Appl. Opt., 1991, 30(28): 4119～4123

CLP Journals

[1] Wang Ning, Shao Jianda, Yi Kui, Wei Chaoyang. Impact of Evaporation Characteristics of SiO₂ on Uniformity of Thin-Film Thickness[J]. Chinese Journal of Lasers, 2010, 37(8): 2051

Tian Xuesong, Liu Jincheng, Li Lianjiang, Liu Jinbo, Wang Qi. Thin Films Thickness Calculation of Vanadium Dioxide Using as Laser Protection Material[J]. Chinese Journal of Lasers, 2008, 35(s1): 161

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