Using a Q-switched YAG laser with three frequencies, the chemical deposition of a Ni-Pd-P nano-film on the semiconductor silicon substract is obtained at ambient temperature. The test proves that the effect of the deposition by a three-wavelengths laser is better than that of a monochromatic one. The results of SEM show that the film has good selectivity. By STM analyses, the laser-induced film grows not only along the surface, but also along the perpendicular direction. The polarization curves indicate that the laser induced chemical deposition of Ni-Pd-P during a short time has high catalytic activity for the hydrogen evolution reaction (HER).